Method for operating a sputter cathode with a target

US7575662B2 · kind B2 · utility

Assignee

• Applied Materials GmbH & Co. KG · DE

Inventors

• Stefan Bangert · Lauentheil, DE
• Wolfgang BUSCHBECK · Hanau, DE
• Markus Hanika · Landsberg, DE
• Karl-Albert KEIM · Büdingen, DE
• Michael König · Frankfurt, DE
• Jorg Krempel-Hesse · Neumarkt i.d.OPf., DE
• Andreas Lopp · Neuses, DE
• Harald Rost · Seligenstadt, DE
• Jurgen Schroeder · Ludwigshafen, DE
• Tobias Stolley · Oberursel, DE

Key dates

• Filing date: Jun 29, 2005
• Grant date: Aug 18, 2009
• Expiry date: Apr 26, 2027

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J37/3455
• WIPO field: Electrical machinery, apparatus, energy
• WIPO sector: Electrical engineering

Abstract

The invention relates to a method for operating a magnetron sputter cathode, in particular a tube cathode or several tube cathodes forming an array. In such cathodes a target passes through a magnetic field, whereby induction currents flow in the target which distort the magnetic field. This results in the nonuniform coating of a substrate. By having the relative movement between magnetic field and target alternately reverse its direction, the effect of the magnetic field distortion can be compensated. This yields greater uniformity of the coating on a substrate to be coated.