Apparatus for obtaining planarity measurements with respect to a probe card analysis system
US7579853B2 · kind B2 · utility
3Cited by
2References
5Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 10, 2008 |
| Grant date | Aug 25, 2009 |
| Priority date | — |
| Expiry date | Jun 10, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R35/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and method of mitigating the effects of component deflections in a probe card analyzer system may implement three-dimensional comparative optical metrology techniques to model deflection characteristics. An exemplary system and method combine non-bussed electrical planarity measurements with fast optical planarity measurements to produce “effectively loaded” planarity measurements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.