Charged particle beam apparatus
US7582885B2 · kind B2 · utility
55Cited by
10References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 12, 2006 |
| Grant date | Sep 1, 2009 |
| Priority date | — |
| Expiry date | Oct 7, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/1825
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A small-sized charged particle beam apparatus capable of maintaining high vacuum even during emission of an electron beam is provided. A nonevaporative getter pump is placed upstream of differential pumping of an electron optical system of the charged particle beam apparatus, and a minimum number of ion pumps are placed downstream, so that both the pumps are used in combination. Further, by mounting a detachable coil on an electron gun part, the inside of a column can be maintained under high vacuum with a degree of vacuum in the order of 10−8 Pa.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.