Coating compositions for use with an overcoated photoresist
US7585612B2 · kind B2 · utility
39Cited by
3References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 5, 2006 |
| Grant date | Sep 8, 2009 |
| Priority date | — |
| Expiry date | Jul 5, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0392
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive following crosslinking. In another aspect, underlying coating composition are provided that can be treated to provide a modulated water contact angle. Preferred coating compositions can enhance lithographic performance of an associated photoresist composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.