Apparatus and method for use of optical system with a plasma processing system
US7591923B2 · kind B2 · utility
25Cited by
11References
24Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 17, 2005 |
| Grant date | Sep 22, 2009 |
| Priority date | — |
| Expiry date | May 18, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32972
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing system and method for operating an optical system in conjunction with a plasma processing system are provided. The plasma processing system includes an optical system in communication with a plasma processing chamber of the plasma processing system. The optical system has a window and is constructed and arranged to detect a plasma process condition through the window and a transmission condition of the window. The method includes detecting an optical emission from the plasma processing region and monitoring contamination of a window provided by the optical system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.