Gas supply facility of a chamber and a method for an internal pressure control of the chamber for which the facility is employed
US7594517B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 28, 2004 |
| Grant date | Sep 29, 2009 |
| Priority date | — |
| Expiry date | Oct 24, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/87507
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
The present invention prevents substantial reduction of flow rate control accuracy in a small flow quantity range, achieves accurate flow rate control over the entire range of flow rate control, and also allows control of a wide pressure range of a chamber with accurate flow rate control. Specifically, a gas supply facility having a plurality of pressure type flow controllers connected in parallel, and a third controller to control operation of the pressure type flow controllers to supply a desired gas exhausted by a vacuum pump to a chamber while controlling its flow rate, is provided wherein one pressure type flow controller is a controller used to control a gas flow rate range up to 10% of the maximum flow rate supplied to the chamber, while the remaining pressure type flow controllers are made to be ones controlling the rest of the gas flow rate range.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.