Patent · US Active

Method of controlling a fabrication process using an iso-dense bias

US7598099B2 · kind B2 · utility

1Cited by

6References

9Claims

0Family size

Assignee

TOKYO ELECTRON LIMITED · JP

Inventors

Joerg Bischoff · Ilmenau, DE
Heiko Weichert · Utzberg, DE

Key dates

Filing date	Nov 7, 2007
Grant date	Oct 6, 2009
Priority date	—
Expiry date	Feb 25, 2028

Classification

Technology area (CPC H)Electricity
CPC primaryH01L2924/0002
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

Embodiments of controlling a fabrication process using an iso-dense bias are generally described herein. Other embodiments may be described and claimed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.