Systems and methods for a gas field ion microscope
US7601953B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 20, 2006 |
| Grant date | Oct 13, 2009 |
| Priority date | — |
| Expiry date | May 6, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2505
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In one aspect the invention provides a gas field ion microscope that includes an ion source in connection with an optical column, such that an ion beam generated at the ion source travels through the optical column and impinges on a sample. The ion source includes an emitter having a width that tapers to a tip comprising a few atoms. In other aspects, the invention provides methods for using the ion microscope to analyze samples and enhancing the performance of a gas field ion source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.