Contamination prevention system, lithographic apparatus, radiation source, and method for manufacturing a device
US7602472B2 · kind B2 · utility
1Cited by
0References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 12, 2007 |
| Grant date | Oct 13, 2009 |
| Priority date | — |
| Expiry date | Sep 12, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A contamination prevention system is constructed and arranged to prevent material from propagating with radiation into a lithographic apparatus. The contamination prevention system includes a rotatable carrier provided with a plurality of generally radially outwardly extending blades. The blades are constructed and arranged to absorb or deflect the material. The system also includes a stationary shaft, and a bearing constructed and arranged to rotate the rotatable carrier and the blades around the shaft. The rotatable carrier is provided with a space for at least partially receiving a portion of the shaft.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.