Cleaning of native oxide with hydrogen-containing radicals
US7604708B2 · kind B2 · utility
212Cited by
69References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 12, 2004 |
| Grant date | Oct 20, 2009 |
| Priority date | — |
| Expiry date | Oct 20, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02046
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate cleaning apparatus has a remote source to remotely energize a hydrogen-containing gas to form an energized gas having a first ratio of ionic hydrogen-containing species to radical hydrogen-containing species. The apparatus has a process chamber with a substrate support, an ion filter to filter the remotely energized gas to form a filtered energized gas having a second ratio of ionic hydrogen-containing species to radical hydrogen-containing species, the second ratio being different than the first ratio, and a gas distributor to introduce the filtered energized gas into the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.