Patent · US Active

Plasma ignition and complete faraday shielding of capacitive coupling for an inductively-coupled plasma

US7605008B2 · kind B2 · utility

8Cited by
12References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 2, 2007
Grant dateOct 20, 2009
Priority date
Expiry dateJun 11, 2027

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J37/32623
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A method and apparatus for igniting a gas mixture into plasma using capacitive coupling techniques, shielding the plasma and other contents of the plasma reactor from the capacitively-coupled electric field, and maintaining the plasma using inductive coupling are provided. For some embodiments, the amount of capacitive coupling may be controlled after ignition of the plasma. Such techniques are employed in an effort to prevent damage to the surface of a substrate from excessive ion bombardment caused by the highly energized ions and electrons accelerated towards and perpendicular to the substrate surface by the electric field of capacitively-coupled plasma.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.