Patent · US Active

Method to control BAW resonator top electrode edge during patterning

US7612488B1 · kind B1 · utility

9Cited by
13References
28Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 16, 2007
Grant dateNov 3, 2009
Priority date
Expiry dateAug 23, 2027

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T29/49156
  • WIPO fieldBasic communication processes
  • WIPO sectorElectrical engineering

Abstract

A piezoelectric resonator include a multi-layer top electrode. The multi-layer top electrode includes at least a top metal layer and a bottom metal layer. A top metal layer edge is recessed compared to a bottom metal layer edge allowing conformal deposition of a passivation layer. The passivation layer covers and protects the underlying layers from subsequent etching, thereby preventing etch undercut of the top electrode. In some embodiments, the multi-layer top electrode is configured as a bi-layer. In other embodiments, an extra layer is configured between the top metal layer and the bottom metal layer, for example a shunt load layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.