Patent · US Active

Apparatus and method for removing bubbles from a process liquid

US7615103B2 · kind B2 · utility

0Cited by

8References

21Claims

0Family size

Assignee

Advanced Micro Devices, Inc. · US

Inventors

Helge Hartz · Volkersdorf, DE
Markus Nopper · Dresden, DE
Axel Preusse · Radebeul, DE

Key dates

Filing date	Aug 11, 2005
Grant date	Nov 10, 2009
Priority date	—
Expiry date	Oct 2, 2027

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/2885
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

The present invention is directed to methods and apparatuses for removing bubbles from a process liquid. The process liquid can comprise a plating solution used in a plating tool. The process liquid is supplied to a tank. A plurality of streams of the process liquid are directed towards a surface of the process liquid from below. This can be done by feeding the process liquid to a flow distributor comprising a plurality of openings providing flow communication between an inner volume of the flow distributor and a main volume of the tank. Before leaving the tank through an outlet, the process liquid flows through a flow barrier.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.