Markus Nopper
16Patents
5h-index
15Co-inventors
55Inventor score
Filing activity: Jul 30, 2002 → Oct 25, 2010
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6951816B2 | Method of forming a metal layer over patterned dielectric by electroless deposition using a catalyst | Electricity | 17 | Expired |
| US6620726B1 | Method of forming metal lines having improved uniformity on a substrate | Electricity | 10 | Expired |
| US8314494B2 | Metal cap layer of increased electrode potential for copper-based metal regions in semiconductor devices | Electricity | 9 | Active |
| US8883610B2 | Microstructure device including a metallization structure with self-aligned air gaps between closely spaced metal lines | Electricity | 6 | Active |
| US7781343B2 | Semiconductor substrate having a protection layer at the substrate back side | Electricity | 5 | Active |
| US6958247B2 | Method of electroplating copper over a patterned dielectric layer to enhance process uniformity of a subsequent CMP process | Electricity | 5 | Expired |
| US7899570B2 | Advanced automatic deposition profile targeting and control by applying advanced polish endpoint system feedback | Electricity | 4 | Active |
| US7947158B2 | Apparatus and method for removing bubbles from a process liquid | Electricity | 1 | Active |
| US7169664B2 | Method of reducing wafer contamination by removing under-metal layers at the wafer edge | Emerging Cross-Sectional Technologies | 1 | Expired |
| US7560381B2 | Technique for metal deposition by electroless plating using an activation scheme including a substrate heating process | Electricity | 1 | Active |
| US7517782B2 | Method of forming a metal layer over a patterned dielectric by wet chemical deposition including an electroless and a powered phase | Electricity | 1 | Active |
| US7476552B2 | Method of reworking a semiconductor structure | Electricity | 0 | Active |
| US8389401B2 | Contact elements of semiconductor devices formed on the basis of a partially applied activation layer | Electricity | 0 | Active |
| US7781329B2 | Reducing leakage in dielectric materials including metal regions including a metal cap layer in semiconductor devices | Electricity | 0 | Active |
| US7615103B2 | Apparatus and method for removing bubbles from a process liquid | Electricity | 0 | Active |
| US8323471B2 | Automatic deposition profile targeting | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.