Exposure apparatus and device fabrication method using the same
US7626680B2 · kind B2 · utility
0Cited by
3References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 17, 2008 |
| Grant date | Dec 1, 2009 |
| Priority date | — |
| Expiry date | Jun 17, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7088
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus includes an original-form stage for holding an original form, a projection optical system for introducing light from the original form into an object to be exposed, and a detection optical system for detecting positions at plural points on the original form, in an optical-axis direction of the projection optical system, wherein a space for enclosing the original-form stage is different from a space for enclosing at least part of the detection optical system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.