Electric charged particle beam microscopy and electric charged particle beam microscope
US7633064B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 5, 2007 |
| Grant date | Dec 15, 2009 |
| Priority date | — |
| Expiry date | Jun 1, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3045
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electric charged particle beam microscope measures a geometric distortion at an arbitrary magnification with high precision, and corrects the geometric distortion. A geometric distortion at a first magnification is measured as an absolute distortion based on a standard specimen having a cyclic structure. A microscopic structure specimen is photographed at a geometric distortion measured first magnification and at a geometric distortion unmeasured second magnification. The image at the first magnification is equally transformed to the second magnification to generate a scaled image. The geometric distortion at the second magnification is measured as a relative distortion based on the scaled image. The absolute distortion at the second magnification is obtained on the basis of the absolute distortion at the first magnification and the relative distortion at the second magnification. Subsequently, the second magnification is replaced with the first magnification, and the relative distortion measurement is repeated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.