Phase shifting photomask and a method of fabricating thereof
US7635546B2 · kind B2 · utility
1Cited by
3References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 14, 2007 |
| Grant date | Dec 22, 2009 |
| Priority date | — |
| Expiry date | Aug 14, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/54
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A phase shifting photomask comprising a patterned film stack formed on a transparent substrate and a method of fabricating the photomask are disclosed. In one embodiment, the film stack includes a first layer having a pre-determined value of transparency to light of an illumination source of a lithographic system and a second layer that is substantially transparent to the light and facilitates in the light a pre-determined phase shift.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.