Multi-tray film precursor evaporation system and thin film deposition system incorporating same
US7638002B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 29, 2004 |
| Grant date | Dec 29, 2009 |
| Priority date | — |
| Expiry date | Mar 6, 2026 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/16
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A high conductance, multi-tray solid precursor evaporation system coupled with a high conductance vapor delivery system is described for increasing deposition rate by increasing exposed surface area of solid precursor. The multi-tray solid precursor evaporation system includes a base tray with one or more upper trays. Each tray is configured to support and retain film precursor in, for example, solid powder form or solid tablet form. Additionally, each tray is configured to provide for a high conductance flow of carrier gas over the film precursor while the film precursor is heated. For example, the carrier gas flows inward over the film precursor, and vertically upward through a flow channel within the stackable trays and through an outlet in the solid precursor evaporation system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.