Method for cleaning microwave applicator tube
US7638004B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 31, 2006 |
| Grant date | Dec 29, 2009 |
| Priority date | — |
| Expiry date | Apr 10, 2027 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/44
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of cleaning a microwave plasma applicator tube as described herein includes preparing a microwave plasma applicator for cleaning. A general cleaning of the plasma applicator tube is performed using an organic solvent wash and an ultrapure water wash. Selective cleanings of the tube are performed to remove selected contaminants. Such cleanings include a third wash with an alkaline cleaning solution, a fourth wash with an acidic cleaning solution and another wash using an ammonia and peroxide solution. The tube is rinsed using a sonicating wash performed in ultrapure water followed by drying. Also, the coil can be cleaned using acidic wash solution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.