Antireflective composition for photoresists
US7638262B2 · kind B2 · utility
11Cited by
17References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 10, 2006 |
| Grant date | Dec 29, 2009 |
| Priority date | — |
| Expiry date | Sep 13, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/952
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to an antireflective coating composition for a photoresist layer comprising a polymer, a crosslinking agent and an acid generator, where the polymer comprises at least one unit of structure 1,where, The invention further relates to a process for imaging the antireflective coating composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.