Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer
US7638266B2 · kind B2 · utility
3Cited by
8References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 12, 2004 |
| Grant date | Dec 29, 2009 |
| Priority date | — |
| Expiry date | Mar 14, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/095
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A barrier layer for fabricating at least one of a device and a mask includes a polymeric photoacid generator formed between a substrate and a resist layer. The barrier layer may be used, for example, in forming a resist image, and forming a patterned material feature on a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.