Method, program product and apparatus for optimizing illumination for full-chip layer

US7639864B2 · kind B2 · utility

Assignee

• ASML Masktools B.V. · NL

Inventors

• Robert John Socha · Campbell, US
• Jang Fung Chen · Cupertino, US

Key dates

• Filing date: Feb 23, 2006
• Grant date: Dec 29, 2009
• Expiry date: Jul 28, 2028

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70125
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Optimization of illumination for a full-chip layer is disclosed. A pitch frequency of the full-chip layer is determined so as to generate a pitch frequency histogram of the full-chip layer. The pitch frequency indicates how often a given pitch occurs in the full-chip layer. The pitch frequency histogram is equated to be the first eigenfunction from the sum of coherent system representation of a transformation cross coefficient. An integral equation for the first eigenfunction of the transformation cross coefficient is solved so as to define the optimal illumination for imaging the full-chip layer.