Semiconductor device having in-chip critical dimension and focus patterns
US7642101B2 · kind B2 · utility
3Cited by
1References
14Claims
0Family size
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Key dates
| Filing date | Dec 5, 2006 |
| Grant date | Jan 5, 2010 |
| Priority date | — |
| Expiry date | Jun 27, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A semiconductor device is fabricated to include one or more sets of calibration patterns used to measure line pitch and line focus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.