Method and apparatus for angular-resolved spectroscopic lithography characterization
US7643666B2 · kind B2 · utility
15Cited by
29References
16Claims
0Family size
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Key dates
| Filing date | Aug 8, 2006 |
| Grant date | Jan 5, 2010 |
| Priority date | — |
| Expiry date | Jul 29, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V10/60
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Reconstruction of an object by which radiation is diffracted is disclosed. Specifically, the reconstruction includes: estimating the object shape; deriving a model diffraction pattern from the estimated shape; illuminating the object with radiation; detecting a diffraction pattern of radiation diffracted by the object; comparing the model diffraction pattern and the detected diffraction pattern; and determining the actual object shape from the difference between the model diffraction pattern and the detected diffraction pattern, wherein the model diffraction pattern is determined using Bloch Mode Expansion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.