Irwan Dani Setija
20Patents
5h-index
32Co-inventors
69Inventor score
Filing activity: Apr 26, 2001 → Sep 15, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6704089B2 | Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured thereby | Physics | 15 | Expired |
| US7643666B2 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Physics | 15 | Active |
| US8189195B2 | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method | Physics | 9 | Active |
| US7002667B2 | Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured thereby | Physics | 7 | Expired |
| US7440079B2 | Lithographic apparatus, alignment system, and device manufacturing method | Physics | 6 | Active |
| US6995831B2 | Lithographic apparatus with alignment subsystem, device manufacturing method, using alignment, and alignment structure | Physics | 5 | Expired |
| US9939250B2 | Methods and apparatus for calculating electromagnetic scattering properties of a structure and for estimation of geometrical and material parameters thereof | Physics | 4 | Active |
| US8706455B2 | Methods and apparatus for calculating electromagnetic scattering properties of a structure using a normal-vector field and for reconstruction of approximate structures | Physics | 3 | Active |
| US8724109B2 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Physics | 3 | Active |
| US8645109B2 | Methods and apparatus for determining electromagnetic scattering properties and structural parameters of periodic structures | Physics | 2 | Active |
| US10788765B2 | Method and apparatus for measuring a structure on a substrate | Physics | 2 | Active |
| US8520212B2 | Scatterometry method and measurement system for lithography | Physics | 2 | Active |
| US9772562B2 | Method and apparatus for measuring a structure on a substrate, models for error correction, computer program products for implementing such methods and apparatus | Physics | 2 | Active |
| US8875078B2 | Reference library generation method for methods of inspection, inspection apparatus and lithographic apparatus | Physics | 1 | Active |
| US6987556B2 | Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured thereby | Physics | 1 | Expired |
| US11042096B2 | Alignment measurement system | Physics | 1 | Active |
| US10942461B2 | Alignment measurement system | Physics | 0 | Active |
| US12393046B2 | Metrology systems, coherence scrambler illumination sources and methods thereof | Physics | 0 | Active |
| US10948409B2 | Method and apparatus for calculating electromagnetic scattering properties of finite periodic structures | Physics | 0 | Active |
| US10408753B2 | Method and apparatus for calculating electromagnetic scattering properties of finite periodic structures | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.