Solid precursor vaporization system for use in chemical vapor deposition
US7651570B2 · kind B2 · utility
26Cited by
24References
40Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 31, 2005 |
| Grant date | Jan 26, 2010 |
| Priority date | — |
| Expiry date | Sep 1, 2025 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/16
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A solid precursor vaporization system configured for use in a deposition system, such as thermal chemical vapor deposition (TCVD), is described. The solid precursor vaporization system comprises a plurality of concentric solid precursor cylinders supported on a gas distribution plate and configured to provide a substantially constant surface area as solid precursor is consumed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.