Patent · US Active

Method for determining lithographic focus and exposure

US7656512B2 · kind B2 · utility

11Cited by

8References

40Claims

0Family size

Assignee

KLA-Tencor Technologies Corp. · US

Inventors

Walter D. Mieher · Los Gatos, US
Thaddeus Gerard Dziura · San Jose, US
Ady Levy · Sunnyvale, US
Chris Mack · Austin, US

Key dates

Filing date	Apr 11, 2008
Grant date	Feb 2, 2010
Priority date	—
Expiry date	Apr 11, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70641
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for determining one or more process parameter settings of a photolithographic system is disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.