Apparatus for angular-resolved spectroscopic lithography characterization and device manufacturing method
US7659988B2 · kind B2 · utility
3Cited by
27References
18Claims
0Family size
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Key dates
| Filing date | Feb 9, 2007 |
| Grant date | Feb 9, 2010 |
| Priority date | — |
| Expiry date | Aug 28, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7003
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
To inspect all portions of the substrate the substrate table can be moved rotationally and linearly. Furthermore the detector can be moved rotationally. This enables all portions of a surface of the substrate to be inspected from all angles in a plane parallel to the substrate. Less linear motion is needed, so the apparatus occupies a smaller volume and generates smaller vibrations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.