Apparatus for the removal of a metal oxide from a substrate and methods therefor
US7662253B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 27, 2005 |
| Grant date | Feb 16, 2010 |
| Priority date | — |
| Expiry date | Oct 14, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/2418
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus generating a plasma for removing metal oxide from a substrate is disclosed. The embodiment includes a powered electrode assembly, including a powered electrode, a first dielectric layer, and a first wire mesh disposed between the powered electrode and the first dielectric layer. The embodiment also includes a grounded electrode assembly disposed opposite the powered electrode assembly so as to form a cavity wherein the plasma is generated, the first wire mesh being shielded from the plasma by the first dielectric layer when the plasma is present in the cavity, the cavity having an outlet at one end for providing the plasma to remove the metal oxide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.