Ion beam current uniformity monitor, ion implanter and related method
US7663125B2 · kind B2 · utility
5Cited by
11References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 29, 2007 |
| Grant date | Feb 16, 2010 |
| Priority date | — |
| Expiry date | Feb 3, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31703
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ion beam current uniformity monitor, ion implanter and related method are disclosed. In one embodiment, the ion beam current uniformity monitor includes an ion beam current measurer including a plurality of measuring devices for measuring a current of an ion beam at a plurality of locations; and a controller for maintaining ion beam current uniformity based on the ion beam current measurements by the ion beam current measurer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.