Vaporizer and semiconductor processing apparatus
US7666260B2 · kind B2 · utility
4Cited by
10References
30Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 11, 2004 |
| Grant date | Feb 23, 2010 |
| Priority date | — |
| Expiry date | May 11, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4486
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A vaporizer includes a vaporizing chamber configured to vaporize a liquid material and thereby form a gas material. A spray portion is configured to spray the liquid material in the vaporizing chamber. A delivery part is configured to deliver the gas material from the vaporizing chamber to a gas outlet. A heating portion is configured to heat the vaporizer. The delivery part includes a filter member covering the gas outlet and configured to allow the gas material to pass therethrough. A shield plate is disposed to cover the filter member on a side farther from the gas outlet.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.