Apparatus and method of gas injection sequencing
US7666479B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 10, 2007 |
| Grant date | Feb 23, 2010 |
| Priority date | — |
| Expiry date | May 10, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/0324
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus and method for gas injection sequencing in order to increase the gas injection total pressure while satisfying an upper limit to the process gas flow rate, thereby achieving gas flow uniformity during a sequence cycle and employing practical orifice configurations. The gas injection system includes a gas injection electrode having a plurality of regions, through which process gas flows into the process chamber. The gas injection system further includes a plurality of gas injection plenums, each independently coupled to one of the aforesaid regions and a plurality of gas valves having an inlet end and an outlet end, where the outlet end is independently coupled to one of the aforesaid plurality of gas injection plenums. The gas injection system includes a controller coupled to the plurality of gas valves for sequencing the flow of process gas through the aforesaid plurality of regions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.