Patent · US Active

Method of achieving CD linearity control for full-chip CPL manufacturing

US7667216B2 · kind B2 · utility

1Cited by

25References

11Claims

0Family size

Assignee

ASML Masktools B.V. · NL

Inventors

Doug Van Den Broeke · Sunnyvale, US
Chungwei Hsu · Taipei, TW
Jang Fung Chen · Cupertino, US

Key dates

Filing date	Feb 20, 2007
Grant date	Feb 23, 2010
Priority date	—
Expiry date	Jul 31, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/34
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method of generating masks for printing a pattern including a plurality of features having varying critical dimensions. The method includes the steps of: (1) obtaining data representing the pattern; (2) defining a plurality of distinct zones based on the critical dimensions of the plurality of features; (3) categorizing each of the features into one of the plurality of distinct zones; and (4) modifying the mask pattern for each feature categorized into a predefined distinct zone of the plurality of distinct zones.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.