Chungwei Hsu
4Patents
2h-index
6Co-inventors
33Inventor score
Filing activity: Aug 3, 1999 → Feb 20, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6083807A | Overlay measuring mark and its method | Electricity | 21 | Expired |
| US6215546A | Method of optical correction for improving the pattern shrinkage caused by scattering of the light | Physics | 2 | Expired |
| US7211815B2 | Method of achieving CD linearity control for full-chip CPL manufacturing | Physics | 1 | Expired |
| US7667216B2 | Method of achieving CD linearity control for full-chip CPL manufacturing | Physics | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.