Exhaust system for a vacuum processing system
US7670432B2 · kind B2 · utility
357Cited by
10References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 8, 2006 |
| Grant date | Mar 2, 2010 |
| Priority date | — |
| Expiry date | May 19, 2026 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4412
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method, computer readable medium, and system for treating a substrate in a process space of a vacuum processing system is described. A vacuum pump in fluid communication with the vacuum processing system and configured to evacuate the process space, while a process material supply system is pneumatically coupled to the vacuum processing system and configured to supply a process gas to the process space. Additionally, the vacuum pump is pneumatically coupled to the process supply system and configured to, at times, evacuate the process gas supply system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.