Polymer, resist protective coating material, and patterning process
US7670750B2 · kind B2 · utility
46Cited by
3References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 3, 2007 |
| Grant date | Mar 2, 2010 |
| Priority date | — |
| Expiry date | Oct 3, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2041
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist protective coating material comprises a polymer comprising repeat units having formulae (1a) and (1b) and having a Mw of 1,000-500,000. R1a and R1b are H, F or alkyl or fluoroalkyl, R2a, R2b, R3a and R3b are H or alkyl, or R2a and R2b, and R3a and R3b may bond together to form a ring, 0<a<1, 0<b<1, a+b=1, and n=1 to 4. The protective coating material is improved in water repellency and water slip. In the ArF immersion lithography, it is effective in preventing water penetration and leaching of additives from the resist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.