Fast axis beam profile shaping by collimation lenslets for high power laser diode based annealing system
US7674999B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 23, 2006 |
| Grant date | Mar 9, 2010 |
| Priority date | — |
| Expiry date | Jan 4, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T117/1016
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A dynamic surface anneal apparatus for annealing a semiconductor workpiece has a workpiece support for supporting a workpiece, an optical source and scanning apparatus for scanning the optical source and the workpiece support relative to one another along a fast axis. The optical source includes an array of laser emitters arranged generally in successive rows of the emitters, the rows being transverse to the fast axis. Plural collimating lenslets overlie respective ones of the rows of emitters and provide collimation along the fast axis. The selected lenslets have one or a succession of optical deflection angles corresponding to beam deflections along the fast axis for respective rows of emitters. Optics focus light from the array of laser emitters onto a surface of the workpiece to form a succession of line beams transverse to the fast axis spaced along the fast axis in accordance with the succession of deflection angles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.