Patent · US Active

Technique for shaping a ribbon-shaped ion beam

US7675047B2 · kind B2 · utility

6Cited by

10References

20Claims

0Family size

Assignee

Varian Semiconductor Equipment Associates, Inc. · US

Inventors

Svetlana B. Radovanov · Marblehead, US
Peter L. Kellerman · Essex, US
Victor M. Benveniste · Gloucester, US
Robert C. Lindberg · Rockport, US
Kenneth H. Purser · Lexington, US
Tyler Rockwell · Wakefield, US
James S. Buff · Brookline, US
Anthony Renau · West Newbury, US

Key dates

Filing date	Sep 29, 2006
Grant date	Mar 9, 2010
Priority date	—
Expiry date	Dec 20, 2027

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/121
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A technique for shaping a ribbon-shaped ion beam is disclosed. In one particular exemplary embodiment, the technique may be realized as an apparatus for shaping a ribbon-shaped ion beam. The apparatus may comprise an electrostatic lens having a substantially rectangular aperture for a ribbon-shaped ion beam to pass through, wherein a plurality of focusing elements are positioned along short edges of the aperture, and wherein each focusing element is separately biased and oriented to shape the ribbon-shaped ion beam.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.