Methods and compositions for providing photoresist with improved properties for contacting liquids
US7678527B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 16, 2003 |
| Grant date | Mar 16, 2010 |
| Priority date | — |
| Expiry date | Oct 16, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0392
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Embodiments of the invention provide methods and compositions for providing photoresists with improved liquid-contact properties. For one embodiment of the invention, a photoresist is provided having one or more constituent components that are resistant to diffusion between the photoresist and an index-matching liquid (IML). For such an embodiment in which the IML is water, a photoresist component is provided that is hydrophobic thus reducing diffusion between the photoresist and the water. In various alternative embodiments of the invention, a photoresist is provided having one or more constituent components that encourage diffusion between the photoresist layer and the IML in such manner as to impart beneficial liquid-contact properties to the photoresist layer. For such an embodiment in which the IML is water, a photoresist is provided having one or more hydrophilic constituents.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.