Sensor for ion implanter
US7683348B2 · kind B2 · utility
2Cited by
16References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 11, 2006 |
| Grant date | Mar 23, 2010 |
| Priority date | — |
| Expiry date | Mar 9, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31705
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A Faraday cup structure for use with a processing tool. The cup structure has a conductive strike plate coupled to a circuit for monitoring ions striking the strike plate to obtain an indication of the ion beam current. The electrically conductive strike plate is fronted by a mask for dividing an ion beam intercepting cross section into regions or segments. The mask including walls extending to the strike plate for impeding ions reaching the sensor and particles dislodged from the sensor from entering into the evacuated region of the processing tool.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.