Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
US7684010B2 · kind B2 · utility
6Cited by
23References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 9, 2005 |
| Grant date | Mar 23, 2010 |
| Priority date | — |
| Expiry date | Jul 17, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of a substrate table is arranged to be easily applied and removed and in an embodiment, reduces transmission of forces between the different parts.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.