Apparatus for shielding process chamber port
US7685965B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 26, 2006 |
| Grant date | Mar 30, 2010 |
| Priority date | — |
| Expiry date | Apr 5, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32477
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A port provides access to a process chamber interior for exemplary gas injection and process analysis and measurement. Centering the port in an external RF coil reduces the strength of an electric field across the port in generating plasma in the chamber. Plasma-induced etching and deposition in a bore of a gas injection injector mounted in the port is reduced by a grounded shield surrounding a region defined by the port, extending the life of the injector and of a chamber window in which the port is provided. The shield surrounds the region, and is configured with a longitudinally-extending slot defining a retainer arm and a flexure junction, and with a retainer foot on the arm. The junction urges the arm to extend the foot into a retainer groove of the port, and flexes to permit foot movement out of the groove in removal of the shield from the port.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.