Methods, systems, and carrier media for evaluating reticle layout data
US7689966B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 14, 2005 |
| Grant date | Mar 30, 2010 |
| Priority date | — |
| Expiry date | Mar 2, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Various computer-implemented methods are provided. One method for evaluating reticle layout data includes generating a simulated image using the reticle layout data as input to a model of a reticle manufacturing process. The simulated image illustrates how features of the reticle layout data will be formed on a reticle by the reticle manufacturing process. The method also includes determining manufacturability of the reticle layout data using the simulated image. The manufacturability is a measure of how accurately the features will be formed on the reticle. Also provided are various carrier media that include program instructions executable on a computer system for performing a method for evaluating reticle layout data as described herein. In addition, systems configured to evaluate reticle layout data are provided. The systems include a computer system and a carrier medium that includes program instructions executable on the computer system for performing method(s) described herein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.