Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas
US7696117B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2007 |
| Grant date | Apr 13, 2010 |
| Priority date | — |
| Expiry date | Apr 27, 2027 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC04B2235/9692
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A ceramic article which is resistant to erosion by halogen-containing plasmas used in semiconductor processing. The ceramic article includes ceramic which is multi-phased, typically including two phase to three phases. The ceramic is formed from yttrium oxide at a molar concentration ranging from about 50 mole % to about 75 mole %; zirconium oxide at a molar concentration ranging from about 10 mole % to about 30 mole %; and at least one other component, selected from the group consisting of aluminum oxide, hafnium oxide, scandium oxide, neodymium oxide, niobium oxide, samarium oxide, ytterbium oxide, erbium oxide, cerium oxide, and combinations thereof, at a molar concentration ranging from about 10 mole % to about 30 mole %.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.