Lithographic apparatus and device manufacturing method
US7701550B2 · kind B2 · utility
33Cited by
28References
42Claims
0Family size
Assignees
Inventors
- Nicolaas Rudolf Kemper
- Henrikus Herman Marie Cox
- Sjoerd Nicolaas Lambertus Donders
- Roelof Frederik De Graaf
- Christiaan Alexander Hoogendam
- Nicolaas Ten Kate
- Jeroen Johannes Sophia Maria Mertens
- Frits Van Der Meulen
- Franciscus Johannes Herman Maria Teunissen
- Jan-Gerard Cornelis Van Der Toorn
- Martinus Cornelis Maria Verhagen
- Stefan Philip Christiaan Belfroid
- Johannes Petrus Maria Smeulers
- Herman Vogel
Key dates
| Filing date | Aug 19, 2004 |
| Grant date | Apr 20, 2010 |
| Priority date | — |
| Expiry date | Sep 2, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7095
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.