Patent · US Active

Integrated pressure and flow ratio control system

US7706925B2 · kind B2 · utility

19Cited by
2References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 10, 2007
Grant dateApr 27, 2010
Priority date
Expiry dateMay 24, 2027

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG05D16/2046
  • WIPO fieldControl
  • WIPO sectorInstruments

Abstract

An integrated pressure and flow ratio control system includes N mass flow controllers MFCi (i=1, . . . , N) that each control the flow rate of a fluid Fi (i=1, . . . , N) flowing into a processing chamber. These N mass flow controllers are linked together by a digital communication network. One of the mass flow controllers is a master MFC, and the remaining N−1 MFCs are slave MFCs. The master MFC receives a pressure set point and a plurality N of flow ratio set points from a host controller, and communicates these set points to all the slave MFCs. In this way, the pressure in the chamber is maintained at the pressure set point and the flow ratios Qi/QT are maintained at the flow ratio set points, where Qi is flow rate of the i-th fluid Fi, and QT=Q1+Q2+ . . . QN is the sum of all N flow rates.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.