Patent · US Active

Imaging device in a projection exposure machine

US7710542B2 · kind B2 · utility

6Cited by

5References

23Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Wolfgang Hummel · Dresden, DE
Jurgen Fischer · Heidenheim, DE
Karl-Eugen Aubele · Geislingen an der Steige, DE
Erich Merz · Oberkochen, DE
Raoul Reiner · Pforzheim, DE
Klaus Rief · Aalen, DE
Stefan Schongart · Ulm, DE
Markus Neumaier · Langenau, DE
Barbel Trossbach · Aalen, DE
Ulrich Weber · Ulm, DE
Michael Mühlbeyer · Aalen, DE
Hubert Holderer · Oberkochen, DE
Alexander Kohl · Aalen, DE
Jochen Weber · Laufenbürg, DE
Johannes Lippert · Buch am Wald, DE
Thorsten Rassel · Wertingen, DE

Key dates

Filing date	Nov 7, 2007
Grant date	May 4, 2010
Priority date	—
Expiry date	Jan 23, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70825
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.