Patent · US Active

Surface defect inspection method and apparatus

US7710557B2 · kind B2 · utility

10Cited by

5References

7Claims

0Family size

Assignee

Hitachi High-Technologies Corporation · JP

Inventors

Yoshimasa Oshima · Yokohama, JP
Toshiyuki Nakao · Yokohama, JP
Shigeru Matsui · Hitachinaka, JP

Key dates

Filing date	Apr 25, 2008
Grant date	May 4, 2010
Priority date	—
Expiry date	Apr 28, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG01N2021/4716
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A surface defect inspection apparatus is structured to add detection signals of multi-directionally detected scattered lights to detect a tiny defect and to individually process the respective detection signals to prevent an error failing to detect an anisotropic defect.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.