Patent · US Active

Projection objective of a microlithographic projection exposure apparatus

US7710640B2 · kind B2 · utility

0Cited by

0References

24Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Susanne Beder · Aalen, DE
Daniel Kraehmer · Aalen, DE
Heiko Feldmann · Aalen, DE

Key dates

Filing date	Jun 13, 2008
Grant date	May 4, 2010
Priority date	—
Expiry date	Jun 21, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70966
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A projection objective for a microlithographic projection exposure apparatus. The projection objective can project an image of a mask that can be set in position in an object plane onto a light-sensitive coating layer that can be set in position in an image plane. The projection objective can be designed to operate in an immersion mode, and it can produce at least one intermediate image. The projection objective can include an optical subsystem on the image-plane side which projects the intermediate image into the image plane with an image-plane-side projection ratio having an absolute value of at least 0.3.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.