Lithographic apparatus and device manufacturing method
US7714305B2 · kind B2 · utility
2Cited by
56References
37Claims
0Family size
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Key dates
| Filing date | Mar 9, 2006 |
| Grant date | May 11, 2010 |
| Priority date | — |
| Expiry date | Dec 5, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70425
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror configured to move a patterned radiation beam incident on the substrate in substantial synchronism with the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.